Search engine for discovering works of Art, research articles, and books related to Art and Culture
ShareThis
Javascript must be enabled to continue!

RANCANGAN HETEROJUNCTION BIPOLAR TRANSISTOR SILIKON GERMANIUM (HBT’S SIGE) DENGAN PENDEKATAN POISSON EQUATION

View through CrossRef
Ideally performance of Heterojunction Bipolar Transistor (SiGe HBT's) is the Threshold Frequency (ft) and Maximum Frequency (fmax) and high current gain. In order to get the performance can be used the physics approach that that is heavy doping on the emitter and narrow base width. This research conducted at the design of SiGe HBT's based on a model approach three (3)-dimensional hydrodynamic approach to the Poisson equation with electron transport. Simulation using the software Bipole3 with input parameters based on models developed by IBM's first generation. Results of analysis and discussion show that the design of SiGe HBT's provide the frequency threshold (FT) 56 GHz with a deviation of 7% of the worth of a model developed by IBM. Keywords: HBT’s SiGe, Poisson Equation. ABSTRAK Kinerja ideal dari Heterojunction Bipolar Transistor (HBT’s SiGe) adalah Threshold Frequency ( ft ) dan Maximum Frequency ( fmax ) serta Current Gain yang tinggi. Untuk mendapatkan unjuk kerja yang tersebut dapat digunakan pendekatan physic yaitu heavy doping pada emitter dan lebar basis dibuat sempit (narrow base width). Pada riset ini dilakukan rancangan HBT’s SiGe berdasarkan pendekatan model tiga(3) dimensi hydrodynamic dengan pendekatan Poisson equation electron transport. Simulasi menggunakan perangkat lunak Bipole3 dengan parameter masukan berdasarkan model yang dikembangkan oleh IBM generasi pertama Hasil analisa dan pembahasan menunjukkan bahwa hasil rancangan HBT’s SiGe menghasilkan frekuensi threshold (fT) 56 GHz dengan deviasi senilai 7% terhadap model yang dikembangkan oleh IBM. Kata kunci: HBT’s SiGe, Persamaan Poisson
Title: RANCANGAN HETEROJUNCTION BIPOLAR TRANSISTOR SILIKON GERMANIUM (HBT’S SIGE) DENGAN PENDEKATAN POISSON EQUATION
Description:
Ideally performance of Heterojunction Bipolar Transistor (SiGe HBT's) is the Threshold Frequency (ft) and Maximum Frequency (fmax) and high current gain.
In order to get the performance can be used the physics approach that that is heavy doping on the emitter and narrow base width.
This research conducted at the design of SiGe HBT's based on a model approach three (3)-dimensional hydrodynamic approach to the Poisson equation with electron transport.
Simulation using the software Bipole3 with input parameters based on models developed by IBM's first generation.
Results of analysis and discussion show that the design of SiGe HBT's provide the frequency threshold (FT) 56 GHz with a deviation of 7% of the worth of a model developed by IBM.
Keywords: HBT’s SiGe, Poisson Equation.
ABSTRAK Kinerja ideal dari Heterojunction Bipolar Transistor (HBT’s SiGe) adalah Threshold Frequency ( ft ) dan Maximum Frequency ( fmax ) serta Current Gain yang tinggi.
Untuk mendapatkan unjuk kerja yang tersebut dapat digunakan pendekatan physic yaitu heavy doping pada emitter dan lebar basis dibuat sempit (narrow base width).
Pada riset ini dilakukan rancangan HBT’s SiGe berdasarkan pendekatan model tiga(3) dimensi hydrodynamic dengan pendekatan Poisson equation electron transport.
Simulasi menggunakan perangkat lunak Bipole3 dengan parameter masukan berdasarkan model yang dikembangkan oleh IBM generasi pertama Hasil analisa dan pembahasan menunjukkan bahwa hasil rancangan HBT’s SiGe menghasilkan frekuensi threshold (fT) 56 GHz dengan deviasi senilai 7% terhadap model yang dikembangkan oleh IBM.
Kata kunci: HBT’s SiGe, Persamaan Poisson.

Related Results

PEMODELAN PENYEMPITAN CELAH PITA ENERGI SEBAGAI FUNGSI KONSENTRASI DOPING PADA HBT SIGE
PEMODELAN PENYEMPITAN CELAH PITA ENERGI SEBAGAI FUNGSI KONSENTRASI DOPING PADA HBT SIGE
Smaller bandgap material in the base of SiGe HBT is obtained by using high doping concentration and Germanium addition into the base of silicon bipolar transistor. In this work, a ...
A Benchmark of Germane and Digermane for the Low Temperature Growth of Intrinsic and Heavily in-situ Boron-Doped SiGe
A Benchmark of Germane and Digermane for the Low Temperature Growth of Intrinsic and Heavily in-situ Boron-Doped SiGe
We have recently demonstrated the interest of using Si2H6 + GeH4 for the 450°C-500°C epitaxy of (i) intrinsic SiGe layers and (ii) SiGe:B raised sources and drains [1-4]. One way o...
Analysis of Si/SiGe/Si double heterojunction band of a novelstructure of PIN electronic modulation
Analysis of Si/SiGe/Si double heterojunction band of a novelstructure of PIN electronic modulation
PIN is a common structure of electrical modulation in electro-optic modulator, and the performance of the electro-optic modulator is directly affected by the carrier injection in P...
Germanium/Silicon-Germanium Heterostructure Avalanche Photodiodes on Silicon
Germanium/Silicon-Germanium Heterostructure Avalanche Photodiodes on Silicon
Near-infrared photodiodes (PDs) of Ge on Si have been widely studied in Si photonics for the optical communications (1.3–1.6 μm). Ge-based avalanche PDs (APDs) have been also studi...
SiGe/Si Microwave Photonic devices and Interconnects towards Silicon-based full Optical Links
SiGe/Si Microwave Photonic devices and Interconnects towards Silicon-based full Optical Links
SiGe / Si micro-ondes photoniques Phototransistors et interconnexions vers Silicon-base tous les liens optiques Avec la croissance forte de ces dernières années des...
Germanium, Tin, and Copper
Germanium, Tin, and Copper
AbstractGermanium is a semiconducting metal from Group IVA of the periodic table.The physical and chemical properties of germanium and some of its compounds are listed.In 1886 Clem...
Nanoscale quantitative characterization of 22nm CMOS transistor using Scanning Transmission Electron Microscopy ( STEM )
Nanoscale quantitative characterization of 22nm CMOS transistor using Scanning Transmission Electron Microscopy ( STEM )
22nm Silicon‐On‐Insulator (SOI) complementary metal‐oxide semiconductor (CMOS) technology has a number of performance boosters, such as third generation embedded DRAM, embedded str...

Back to Top