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(Invited) Junctionless Device Cross-Section: A Key Aspect for Overcoming Boltzmann Tyranny
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In this work, we report on the significance of device cross-section of a 3-dimensional Junctionless transistor (JLT) to facilitate a sharp rise in drain current with a low value (< 10 mV/decade) of subthreshold swing (S
S). The analysis shows that apart from the usual device parameters such as gate length and drain voltage, the cross-section of a tri-gate JLT offers an additional degree of freedom to tune the extent of impact ionization in JLT. Results demonstrate that tri-gate JLT designed with lower aspect ratio (< 0.5) and wider film is most appropriate to overcome Boltzmann tyranny. The work highlights the usefulness of cross-sectional area for achieving sharp rise in drain current in JLT.
Title: (Invited) Junctionless Device Cross-Section: A Key Aspect for Overcoming Boltzmann Tyranny
Description:
In this work, we report on the significance of device cross-section of a 3-dimensional Junctionless transistor (JLT) to facilitate a sharp rise in drain current with a low value (< 10 mV/decade) of subthreshold swing (S
S).
The analysis shows that apart from the usual device parameters such as gate length and drain voltage, the cross-section of a tri-gate JLT offers an additional degree of freedom to tune the extent of impact ionization in JLT.
Results demonstrate that tri-gate JLT designed with lower aspect ratio (< 0.
5) and wider film is most appropriate to overcome Boltzmann tyranny.
The work highlights the usefulness of cross-sectional area for achieving sharp rise in drain current in JLT.
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