Search engine for discovering works of Art, research articles, and books related to Art and Culture
ShareThis
Javascript must be enabled to continue!

Characteristics and Applications of CAAC-IGZO FET with Gate Length of 13nm

View through CrossRef
A field-effect transistor (FET) with a gate length of 13 nm having a c-axis aligned crystalline In-Ga-Zn oxide (CAAC-IGZO) channel was fabricated. The CAAC-IGZO FET has an off-state leakage current of 200 yA/μm, a cutoff frequency of 60GHz, and a maximum oscillation frequency of 16GHz. A CAAC-IGZO FET, though it is a small transistor, withstands voltages up to approximately 2.5 V. It also has stable current characteristics with less temperature dependence than Si devices. We have constructed an equivalent-circuit model of the CAAC-IGZO FET and designed an RF amplifier to show CAAC-IGZO FET's applicability to the GHz-range RF circuitry.
Title: Characteristics and Applications of CAAC-IGZO FET with Gate Length of 13nm
Description:
A field-effect transistor (FET) with a gate length of 13 nm having a c-axis aligned crystalline In-Ga-Zn oxide (CAAC-IGZO) channel was fabricated.
The CAAC-IGZO FET has an off-state leakage current of 200 yA/μm, a cutoff frequency of 60GHz, and a maximum oscillation frequency of 16GHz.
A CAAC-IGZO FET, though it is a small transistor, withstands voltages up to approximately 2.
5 V.
It also has stable current characteristics with less temperature dependence than Si devices.
We have constructed an equivalent-circuit model of the CAAC-IGZO FET and designed an RF amplifier to show CAAC-IGZO FET's applicability to the GHz-range RF circuitry.

Related Results

Characteristics and Applications of CAAC-IGZO FET with Gate Length of 13nm
Characteristics and Applications of CAAC-IGZO FET with Gate Length of 13nm
A field-effect transistor (FET) using CAAC-IGZO, a crystalline oxide semiconductor having a c-axis alignment, is considered for application to various circuits. In particular, its ...
Floating gate effect in amorphous InGaZnO thin-film transistor
Floating gate effect in amorphous InGaZnO thin-film transistor
In recent years, considerable attention has been paid to amorphous indium gallium-zinc-oxide (a-IGZO) thin film transistors (TFTs) for high performance flat panel display, such as ...
Notched Gate and Graded Gate Oxide Processing for Reduced Capacitance Application in RF MOSFETs
Notched Gate and Graded Gate Oxide Processing for Reduced Capacitance Application in RF MOSFETs
As the demands of RF applications are rising, optimization of internal MOSFETs capacitances is a key issue to improve the cut-off frequency. In this abstract we report the developm...
Investigation of the Gate Degradation Induced by Forward Gate Voltage Stress in p-GaN Gate High Electron Mobility Transistors
Investigation of the Gate Degradation Induced by Forward Gate Voltage Stress in p-GaN Gate High Electron Mobility Transistors
In this work, we investigated the degradation of the p-GaN gate stack induced by the forward gate voltage stress in normally off AlGaN/GaN high electron mobility transistors (HEMTs...
Clinical characteristics and related factors of fungal empyema thoracis
Clinical characteristics and related factors of fungal empyema thoracis
Abstract ObjectData on the characteristics and related factors of fungal empyema thoracis (FET) are limited. Our aim is to investigate the clinical characteristics and rela...
The preparation and characteristics research of high mobility amorphous indium gallium zinc oxide thin-film transistors
The preparation and characteristics research of high mobility amorphous indium gallium zinc oxide thin-film transistors
Indium gallium zinc oxide (IGZO) is widely used in thin-film transistors (TFT) as an active layer due to its high mobility and transmittance. The amorphous n-type indium gallium zi...

Back to Top