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Comparison of Carrier Deflection between MAG-TFET and MAG-FinFET
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This paper is a comparison of the carrier deflection mechanism of a new magnetic sensor structure between the tunneling Field Effect Transistor (TFET) structure and the FinFET structures so-called MAG-TFET and MAG-FinFET.The device relies on carrier deflection from magnetically induced forces. The MAG-TFET current is caused by electron tunneling and drifting through the bulk under gate while the MAG-FinFET current is caused by the drift channel carrier from the inversion layer induced by gate voltages and there is also a bulk current beneath the substrate. The carrier deflection of the device is due to the current in the induced channel and current in the bulk. From the results, carrier deflection in the induced channel is better than in the bulk. The device sensitivity depends on the proportion of these two currents.
Trans Tech Publications, Ltd.
Title: Comparison of Carrier Deflection between MAG-TFET and MAG-FinFET
Description:
This paper is a comparison of the carrier deflection mechanism of a new magnetic sensor structure between the tunneling Field Effect Transistor (TFET) structure and the FinFET structures so-called MAG-TFET and MAG-FinFET.
The device relies on carrier deflection from magnetically induced forces.
The MAG-TFET current is caused by electron tunneling and drifting through the bulk under gate while the MAG-FinFET current is caused by the drift channel carrier from the inversion layer induced by gate voltages and there is also a bulk current beneath the substrate.
The carrier deflection of the device is due to the current in the induced channel and current in the bulk.
From the results, carrier deflection in the induced channel is better than in the bulk.
The device sensitivity depends on the proportion of these two currents.
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