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Methods for Diffractive Elements Surface Profile Fabrication
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The progress in optics is related to wide application of computer-synthesized diffractive optical elements (DOE). The lithography technology allows one to fabricate easily a DOE with binary profile. Using a set of N = 3-4 masks one can fabricate multilevel DOE with the diffraction efficiency (DE) over 90% [1]. Another way to form a DOE profile is based on incoherent spatial filtering of a periodic mask spectrum and bleaching of the exposed film [2]. This method simplifies substantially the process of DOE fabrication because it does not involve fabrication and aligning of a set of masks. However, this method allows to fabricate only periodic DOE.
Optica Publishing Group
Title: Methods for Diffractive Elements Surface Profile Fabrication
Description:
The progress in optics is related to wide application of computer-synthesized diffractive optical elements (DOE).
The lithography technology allows one to fabricate easily a DOE with binary profile.
Using a set of N = 3-4 masks one can fabricate multilevel DOE with the diffraction efficiency (DE) over 90% [1].
Another way to form a DOE profile is based on incoherent spatial filtering of a periodic mask spectrum and bleaching of the exposed film [2].
This method simplifies substantially the process of DOE fabrication because it does not involve fabrication and aligning of a set of masks.
However, this method allows to fabricate only periodic DOE.
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