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Composition Control of Barium Strontium Titanate Thin Films Prepared by Chemical Vapor Deposition
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Composition control of barium strontium titanate thin films
prepared by chemical vapor deposition using Ba(THD)2, Sr(THD)2, and
Ti(THD)2(i-OC3H7)2 (THD: 2,2,6,6-tetramethyl-3,5-heptanedionate) has
been studied by investigating the effects of deposition temperature and
the supply rates of metal sources. Although there were complicated
correlations among the deposition rates of Ba, Sr, and Ti under
kinetically limited conditions, the deposition rate ratio of Ba/Sr was
linearly related to the partial pressure ratio of Ba(THD)2/Sr(THD)2, and
the ratio of Ti/(Ba+Sr) spontaneously approaches unity. In order to
explain these characteristics, we proposed a model wherein the THD
complex of Ba or Sr reacts with the THD complex of Ti and generates a
dimer such as (THD)2Ba–O–Ti(THD)2, and this dimer becomes the
dominant precursor for chemical vapor deposition (CVD) under kinetically limited conditions.
Title: Composition Control of Barium Strontium Titanate Thin Films Prepared by Chemical Vapor Deposition
Description:
Composition control of barium strontium titanate thin films
prepared by chemical vapor deposition using Ba(THD)2, Sr(THD)2, and
Ti(THD)2(i-OC3H7)2 (THD: 2,2,6,6-tetramethyl-3,5-heptanedionate) has
been studied by investigating the effects of deposition temperature and
the supply rates of metal sources.
Although there were complicated
correlations among the deposition rates of Ba, Sr, and Ti under
kinetically limited conditions, the deposition rate ratio of Ba/Sr was
linearly related to the partial pressure ratio of Ba(THD)2/Sr(THD)2, and
the ratio of Ti/(Ba+Sr) spontaneously approaches unity.
In order to
explain these characteristics, we proposed a model wherein the THD
complex of Ba or Sr reacts with the THD complex of Ti and generates a
dimer such as (THD)2Ba–O–Ti(THD)2, and this dimer becomes the
dominant precursor for chemical vapor deposition (CVD) under kinetically limited conditions.
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