Influence of the Ti Content in WO3 Nanorod Films Prepared by Oblique Angle Deposition in Sputtering Technique on the Electrochromic Properties

AbstractIn this work, the effects of Ti content on the electrochromic properties of TiWO3 films are investigated. These films with a nanorod structure are prepared by oblique angle deposition (OAD) in the sputtering process. Sputtered films with a thickness of 100 nm of W and W: Ti for ratios of 5:95 and 50:50 wt.% are thermally oxidized at 500 °C for 1 h. The WO3 nanorod films exhibit a clear crystalline structure, whereas the TiWO3 nanorod films show decreased crystallinity, retaining the crystalline structure of WO3. Moreover, the TiO2 phase appeared in the presence of W: Ti is 50:50 wt.%. The thermally oxidized films show a clear grain cluster‐forming surface. The WO3 nanorod films exhibit the highest optical contrast of 0.485 with a coloration efficiency of 10.129% and superior electrochromic performance compared to TiWO3 nanorod films. Meanwhile, the TW5 films reveal a significant increase in the CV loop, demonstrating the most effective test cycle for electrochromic applications.