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Providing a Specified Level of Electromagnetic Shielding with Nickel Thin Films Formed by DC Magnetron Sputtering
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Nickel films of 4–250 nm thickness were produced by DC magnetron sputtering onto glass and silicon substrates. The electrical properties of the films were investigated by the four-probe method and the surface morphology of the films was studied by atomic force microscopy. To measure the shielding effectiveness, a portable closed stand based on horn antennas was used. A theoretical assessment of the shielding effectiveness of nickel films of various thickness under electromagnetic radiation of a range of frequencies was carried out using two different approximations. The results demonstrate the shielding effectiveness of up to 35 dB of the nickel thin films in the frequency range of 2–18 GHz.
Title: Providing a Specified Level of Electromagnetic Shielding with Nickel Thin Films Formed by DC Magnetron Sputtering
Description:
Nickel films of 4–250 nm thickness were produced by DC magnetron sputtering onto glass and silicon substrates.
The electrical properties of the films were investigated by the four-probe method and the surface morphology of the films was studied by atomic force microscopy.
To measure the shielding effectiveness, a portable closed stand based on horn antennas was used.
A theoretical assessment of the shielding effectiveness of nickel films of various thickness under electromagnetic radiation of a range of frequencies was carried out using two different approximations.
The results demonstrate the shielding effectiveness of up to 35 dB of the nickel thin films in the frequency range of 2–18 GHz.
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