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Laser-induced unitary/composite films of titanium ceramic-metal
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A series of titanium ceramic-metal films with good properties has been designed. The technologies to obtain unitary or composite films [TiN, TiC, TiN-Ti(Cx, Ny)] on titanium base substrates or nontitanium substrates by laser-induction have been developed. On titanium base substrates, the films form through laser-induced chemical reactions between reactants and substrates. On nontitanium substrates, the films form by way of laser-induced chemical vapor deposition (LCVD). In both cases, the reactants, the main reactions, and the influence of main processing parameters on film formation have been investigated. The films were characterized by XRD,SEM/EDAX, EPMA, AES, TEM/SAED and SIMS. We found that the LCVD films are composed of fine equiaxial particles which consist of nanocrystalline grains. The thickness of the films varies from about 0.2-40μm, controlled by the technological conditions. The results measured indicate that these films possess high hardness, excellent wear resistance, good corrosion resistance and adhesive strength. On titanium substrates, the average microhardness of the films is up to HK 2800, and the wear resistance of the films exceeds that of the substrate by a factor of 9-11. Some of these films have been used in industry.
Laser Institute of AmericaLIA
Title: Laser-induced unitary/composite films of titanium ceramic-metal
Description:
A series of titanium ceramic-metal films with good properties has been designed.
The technologies to obtain unitary or composite films [TiN, TiC, TiN-Ti(Cx, Ny)] on titanium base substrates or nontitanium substrates by laser-induction have been developed.
On titanium base substrates, the films form through laser-induced chemical reactions between reactants and substrates.
On nontitanium substrates, the films form by way of laser-induced chemical vapor deposition (LCVD).
In both cases, the reactants, the main reactions, and the influence of main processing parameters on film formation have been investigated.
The films were characterized by XRD,SEM/EDAX, EPMA, AES, TEM/SAED and SIMS.
We found that the LCVD films are composed of fine equiaxial particles which consist of nanocrystalline grains.
The thickness of the films varies from about 0.
2-40μm, controlled by the technological conditions.
The results measured indicate that these films possess high hardness, excellent wear resistance, good corrosion resistance and adhesive strength.
On titanium substrates, the average microhardness of the films is up to HK 2800, and the wear resistance of the films exceeds that of the substrate by a factor of 9-11.
Some of these films have been used in industry.
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