Noise-resistant and aberration-free synthetic aperture digital holographic microscopy for chip topography reconstruction

Phase aberration introduced by an optical system and phase noise caused by parasitic fringes are crucial issues that limit the quality of the reconstructed super-resolution phase image and topography measurement accuracy in synthetic aperture digital holographic microscopy. This paper presents a noise-resistant and aberration-free synthetic aperture digital holographic microscopy for high-precision chip topography reconstruction. Both sample information and phase aberration of the optical system can be simultaneously holographically recorded and reconstructed in a single-shot hologram through polarization multiplexing. This configuration can fundamentally eliminate mechanical scanning errors during the image acquisition process in traditional synthetic aperture holographic microscopy and therefore achieve high-precision phase aberration compensation based on the principle of double exposure at arbitrary illumination angle. Furthermore, through the elaborate design of the overall optical configuration and the improved synthetic aperture algorithm, parasitic noise, speckle noise, and the diffraction noise caused by the reference beam in the reconstructed super-resolution phase can be effectively suppressed. Experimental results demonstrate that the proposed synthetic aperture digital holographic microscopy can enable high-precision, aberration-free, high signal-to-noise ratio, super-resolution phase reconstruction for chips featuring complex topography.