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Improvement of Phase-Shifter Edge Line Mask Method

Two kinds of improved phase-shifter edge line (PEL) masks have been developed for critical dimension control. One new mask consists of a chrome line and partially overlapped shifter film. In this mask, exposed pattern sizes are controlled by adjusting the chrome linewidth. It has been found that a set of repeated fine-chrome lines (“blind”) acts as a uniform light attenuator. The other new mask (“blind PEL mask”) has been devised by combining the “blind” and shifter pattern. These new masks make it possible to delineate different-sized fine patterns (≥0.2 µm) at the same exposure dose. With the “blind PEL-mask”, unnecessary shifter edge patterns can be eliminated by only one-time exposure.

IOP Publishing

Hideyuki Jinbo Hideyuki Jinbo Yoshio Yamashita Yoshio Yamashita

Japanese Journal of Applied Physics

2005

Title: Improvement of Phase-Shifter Edge Line Mask Method

Description:

Two kinds of improved phase-shifter edge line (PEL) masks have been developed for critical dimension control.

One new mask consists of a chrome line and partially overlapped shifter film.

In this mask, exposed pattern sizes are controlled by adjusting the chrome linewidth.

It has been found that a set of repeated fine-chrome lines (“blind”) acts as a uniform light attenuator.

The other new mask (“blind PEL mask”) has been devised by combining the “blind” and shifter pattern.

These new masks make it possible to delineate different-sized fine patterns (≥0.

2 µm) at the same exposure dose.

With the “blind PEL-mask”, unnecessary shifter edge patterns can be eliminated by only one-time exposure.

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