In Situ Interface Control of Pseudomorphic InAs/InP Quantum Well Structure Growth by Surface Photo-Absorption

The exchange reaction of group V atoms was monitored in situ by surface photo-absorption on a submonolayer scale during metalorganic vapor phase epitaxial growth of pseudomorphic InAs/InP heterostructure on (001) InP substrates. About a 0.4-monolayer As/P exchange reaction was observed after arsine was supplied at 0.2 µmol/s onto the In surface of InP at a substrate temperature (T s) of 400°C. At a T s of 350°C, this As/P exchange reaction was suppressed to less than 0.1 monolayer. In contrast, the P/As exchange reaction was less than 0.1 monolayer below 400°C. The benefits of in situ control were shown by growing pseudomorphic InAs/InP single and multiple quantum wells with 1-12 InAs well layers at T s=350°C and characterizing them by cross sectional transmission electron microscopy, photoluminescence, and double crystal X-ray diffraction. Metallurgically abrupt and atomically flat heterostructures without dislocations were grown up to 10 monolayer (ML) of InAs well, which corresponds to the critical layer thickness.