Javascript must be enabled to continue!
Negative temperature dependence of electron multiplication in In0.53Ga0.47As
View through CrossRef
Electron multiplication in In0.53Ga0.47As has been determined from photomultiplication measurements over the temperature range of 20 to 400 K for a series of p–i–n diodes. A negative temperature dependence is observed in the electron multiplication of In0.53Ga0.47As at electric fields over 200 kV/cm, contrary to the positive temperature dependence of collector multiplication previously observed in InP/In0.53Ga0.47As heterojunction bipolar transistors. The results also showed that the breakdown voltage for In0.53Ga0.47As is comparable to GaAs at room temperature, and has a weaker temperature dependence.
AIP Publishing
Title: Negative temperature dependence of electron multiplication in In0.53Ga0.47As
Description:
Electron multiplication in In0.
53Ga0.
47As has been determined from photomultiplication measurements over the temperature range of 20 to 400 K for a series of p–i–n diodes.
A negative temperature dependence is observed in the electron multiplication of In0.
53Ga0.
47As at electric fields over 200 kV/cm, contrary to the positive temperature dependence of collector multiplication previously observed in InP/In0.
53Ga0.
47As heterojunction bipolar transistors.
The results also showed that the breakdown voltage for In0.
53Ga0.
47As is comparable to GaAs at room temperature, and has a weaker temperature dependence.
Related Results
Predictors of False-Negative Axillary FNA Among Breast Cancer Patients: A Cross-Sectional Study
Predictors of False-Negative Axillary FNA Among Breast Cancer Patients: A Cross-Sectional Study
Abstract
Introduction
Fine-needle aspiration (FNA) is commonly used to investigate lymphadenopathy of suspected metastatic origin. The current study aims to find the association be...
Carrier transport in ordered and disordered In0.53Ga0.47As
Carrier transport in ordered and disordered In0.53Ga0.47As
Room temperature recombination dynamics have been studied in partially ordered and disordered ternary alloys of In0.53Ga0.47As by correlated measurements of transmission electron d...
Analysis of trap state densities at HfO2/In0.53Ga0.47As interfaces
Analysis of trap state densities at HfO2/In0.53Ga0.47As interfaces
HfO 2 was deposited on n- and p-type In0.53Ga0.47As by chemical beam deposition. Interface trap densities (Dit) and their energy level distribution were quantified using the conduc...
Surface chemical reactions on In0.53Ga0.47As
Surface chemical reactions on In0.53Ga0.47As
Dark currents on In0.53Ga0.47As mesa photodiodes can be reduced significantly by treating the surfaces with H2SO4:H2O2:XH2O (10≤X≤500) instead of the usual bromine-methanol etch. U...
A retrospective analysis of nitric oxide inhalation in patients with severe acute lung injury in Sweden and Norway 1991–1994
A retrospective analysis of nitric oxide inhalation in patients with severe acute lung injury in Sweden and Norway 1991–1994
Background: Patients with severe acute lung injury (ALI) have been treated compassionately on doctors' initiative with inhaled nitric oxide (INO) in Sweden and Norway since 1991. I...
Isolation, characterization and semi-synthesis of natural products dimeric amide alkaloids
Isolation, characterization and semi-synthesis of natural products dimeric amide alkaloids
Isolation, characterization of natural products dimeric amide alkaloids from roots of the Piper chaba Hunter. The synthesis of these products using intermolecular [4+2] cycloaddit...
H atom parameters: how Classical Physics gives new/clear results
H atom parameters: how Classical Physics gives new/clear results
In our recent paper [A. Bacchieri, Phys. Essays 36, 61 (2023)], we had found that the total escape speed from all the masses in the universe, u = (‐2 u)1/2, where u is the total gr...
DC and RF Performance of 50 nm Gate Pseudomorphic In0.7Ga0.3As/In0.52Al0.48As High Electron Mobility Transistors Grown on (411)A-Oriented InP Substrates by Molecular-Beam Epitaxy
DC and RF Performance of 50 nm Gate Pseudomorphic In0.7Ga0.3As/In0.52Al0.48As High Electron Mobility Transistors Grown on (411)A-Oriented InP Substrates by Molecular-Beam Epitaxy
In this paper, we report on the material and device characteristics of pseudomorphic In0.7Ga0.3As/In0.52Al0.48As high electron mobility transistors (HEMTs) grown on a (411)A-orient...

