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Preparation of YSZ Thin Film on Porous Electrode of SOFC

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AbstractPorous electrode substrate of La0.7Sr0.2MnO3 was used as the support for the deposition of YSZ thin films. The porosity of the electrode substrate was controlled by sintering temperature and particle size of powders. Thin films of YSZ were fabricated on the electrode by sol-gel method. The YSZ film fabricated by 10-fold coating with 0.05M YSZ sol containing TEA was continuous and crack-free one of 5 mm in thickness. However, hydrogen permeation measurement showed that there was a very small leakage of hydrogen in the fabricated film. In addition to sol-gel method, another technique such as EVD should be employed to make the film completely gas-tight.
Springer Science and Business Media LLC
Title: Preparation of YSZ Thin Film on Porous Electrode of SOFC
Description:
AbstractPorous electrode substrate of La0.
7Sr0.
2MnO3 was used as the support for the deposition of YSZ thin films.
The porosity of the electrode substrate was controlled by sintering temperature and particle size of powders.
Thin films of YSZ were fabricated on the electrode by sol-gel method.
The YSZ film fabricated by 10-fold coating with 0.
05M YSZ sol containing TEA was continuous and crack-free one of 5 mm in thickness.
However, hydrogen permeation measurement showed that there was a very small leakage of hydrogen in the fabricated film.
In addition to sol-gel method, another technique such as EVD should be employed to make the film completely gas-tight.

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