Search engine for discovering works of Art, research articles, and books related to Art and Culture
ShareThis
Javascript must be enabled to continue!

Electromigration Characteristics of Cu–Al Precipitate in AlCu Interconnection

View through CrossRef
The behavior of a CuAl precipitate during a direct-current stressing test in an Al–2% Cu interconnection was investigated from observations employing scanning electron microscopy and energy-dispersive X-ray microanalysis. Movement of a CuAl precipitate into the anode direction, accompanied with changes of shape and size, was frequently observed. Measurement of the drift velocity of CuAl precipitates was carried out for the first time, which revealed a value an order of magnitude less than that of solid solute Cu atoms. The obtained activation energy of 0.77 eV corresponds to Cu interface diffusion between a CuAl precipitate and Al lattice. Interaction between two adjacent CuAl precipitates was observed in such a manner that one precipitate became smaller while the other precipitate at the anode site became larger. It is considered that the Cu atoms which constituted the precipitate were transferred to the other precipitate at the anode site by solid-solute electromigration.
Title: Electromigration Characteristics of Cu–Al Precipitate in AlCu Interconnection
Description:
The behavior of a CuAl precipitate during a direct-current stressing test in an Al–2% Cu interconnection was investigated from observations employing scanning electron microscopy and energy-dispersive X-ray microanalysis.
Movement of a CuAl precipitate into the anode direction, accompanied with changes of shape and size, was frequently observed.
Measurement of the drift velocity of CuAl precipitates was carried out for the first time, which revealed a value an order of magnitude less than that of solid solute Cu atoms.
The obtained activation energy of 0.
77 eV corresponds to Cu interface diffusion between a CuAl precipitate and Al lattice.
Interaction between two adjacent CuAl precipitates was observed in such a manner that one precipitate became smaller while the other precipitate at the anode site became larger.
It is considered that the Cu atoms which constituted the precipitate were transferred to the other precipitate at the anode site by solid-solute electromigration.

Related Results

Large-Scale Electromigration Statistics for Cu Interconnects
Large-Scale Electromigration Statistics for Cu Interconnects
AbstractEven after the successful introduction of Cu-based metallization, the electromigration failure risk has remained one of the important reliability concerns for advanced proc...
Electromigration in eutectic SnPb solder lines
Electromigration in eutectic SnPb solder lines
We have prepared eutectic SnPb solder lines for electromigration study by a process of solder reflow into V-grooves etched on (001) Si wafer surfaces. They are thick lines and are ...
Optical Networks Magazine
Optical Networks Magazine
The performance of data- and telecommunication equipment must keep abreast of the increasing network speed. At the same time, it is necessary to deal with the internal interconnect...
Electric Power Network Interconnection: A Review on Current Status, Future Prospects and Research Direction
Electric Power Network Interconnection: A Review on Current Status, Future Prospects and Research Direction
An interconnection of electric power networks enables decarbonization of the electricity system by harnessing and sharing large amounts of renewable energy. The highest potential r...
INVESTIGATING THE INFLUENCE OF MUKTI ALI’S SCIENTIFIC-CUM-DOCTRINER ON AMIN ABDULLAH’S INTEGRATION-INTERCONNECTION IN ISLAMIC STUDIES
INVESTIGATING THE INFLUENCE OF MUKTI ALI’S SCIENTIFIC-CUM-DOCTRINER ON AMIN ABDULLAH’S INTEGRATION-INTERCONNECTION IN ISLAMIC STUDIES
Amin Abdullah's concepts of integration-interconnection and Mukti Ali's scientific-cum-doctriner have something in common. However, when developing his concept of integration-inter...
The Experience of Precipitate Labor
The Experience of Precipitate Labor
ABSTRACT: Background: Despite abundant research on psychosocial factors related to childbirth, no studies have focused on the specific phenomenon of a precipitate labor: A descri...
Electromigration in Sputter Deposited Copper/Zirconium Alloys
Electromigration in Sputter Deposited Copper/Zirconium Alloys
AbstractRF-magnetron sputter deposited copper/zirconium alloy films have been characterised in terms of resistivity, composition, microstructure, texture and stress. The properties...
The Effects of Al(111) Crystal Orientation on Electromigration in Half-Micron Layered Al Interconnects
The Effects of Al(111) Crystal Orientation on Electromigration in Half-Micron Layered Al Interconnects
A study has been done on the crystallographic effects of under-metal planes on Al(111) orientation in layered Al interconnects (Al/Ti, Al/TiN/Ti), and the dominant factor for elect...

Back to Top