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Fabrication of YBaCuO-Josephson-Junctions on MgO-Substrates Damaged by a Focused Ion Beam Prior to Film Deposition
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By using a focused Ga-ion-beam we have damaged micro-areas of MgO-substrates through a protective gold-layer. Two different types of damage are produced: the flat type is to damage the surface by the implantation of Ga-ions whereas the groove type is simply geometrical damage to the substrates by sputtering the MgO. A YBa2Cu3O7-x
(YBaCuO)-film was deposited on the as prepared substrates and the final junction was then defined by photolithography and Ar-milling over the damaged region. Under microwave irradiation Shapiro-steps were observed on these junctions, and a R
n×I
c of up to 3 mV at 4.2 K was achieved for the flat type junctions.
Title: Fabrication of YBaCuO-Josephson-Junctions on MgO-Substrates Damaged by a Focused Ion Beam Prior to Film Deposition
Description:
By using a focused Ga-ion-beam we have damaged micro-areas of MgO-substrates through a protective gold-layer.
Two different types of damage are produced: the flat type is to damage the surface by the implantation of Ga-ions whereas the groove type is simply geometrical damage to the substrates by sputtering the MgO.
A YBa2Cu3O7-x
(YBaCuO)-film was deposited on the as prepared substrates and the final junction was then defined by photolithography and Ar-milling over the damaged region.
Under microwave irradiation Shapiro-steps were observed on these junctions, and a R
n×I
c of up to 3 mV at 4.
2 K was achieved for the flat type junctions.
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