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Detection of Intermediates in Thermal Chemical Vapor Deposition Process Using Tetraethoxysilane
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The thermal decomposition process of tetraethoxysilane (TEOS) in the gas phase has been studied using a gas-chromatograph mass spectrometer (GC-MS) connected to an electric furnace. TEOS decomposed over 500°C to give a TEOS dimer and trimer. It has been confirmed that formation of TEOS oligomers occurs in the gas phase. Ethylene, acetaldehyde and ethanol were also detected, which are low-molecular-weight products formed by thermal decomposition of TEOS. Ethylene was the principal product among the low-molecular-weight products. This indicates that triethoxysilanol is an intermediate in the formation of TEOS oligomers.
Title: Detection of Intermediates in Thermal Chemical Vapor Deposition Process Using Tetraethoxysilane
Description:
The thermal decomposition process of tetraethoxysilane (TEOS) in the gas phase has been studied using a gas-chromatograph mass spectrometer (GC-MS) connected to an electric furnace.
TEOS decomposed over 500°C to give a TEOS dimer and trimer.
It has been confirmed that formation of TEOS oligomers occurs in the gas phase.
Ethylene, acetaldehyde and ethanol were also detected, which are low-molecular-weight products formed by thermal decomposition of TEOS.
Ethylene was the principal product among the low-molecular-weight products.
This indicates that triethoxysilanol is an intermediate in the formation of TEOS oligomers.
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