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Study of x-ray emission from a table top plasma focus and its application as an x-ray backlighter
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A study of a 2 kJ, 200 kA, table top plasma focus device as an intense x-ray source is reported. The x-ray yield from a number of gases, (deuterium, nitrogen, neon, argon, and xenon) is measured as a function of filling pressure and in neon as a function of anode length. In gases with Z<18, the plasma implodes to form a uniform cylindrical column, whereas for Z⩾18, the plasma consists of a number of hot spots. A maximum x-ray yield of 16.6 J and pulse length of 10–15 ns was obtained in neon. The x-ray emission was established to be due to H- and He-like line radiation. The temperature estimated from spectroscopic observations was about 300–400 eV at an electron density of (3–5)×1020 cm−3 in neon. At low pressures in neon, hard x-ray radiation, presumably due to electron beams was dominant. Mesh images of different wire materials were recorded at the optimum pressure in neon as a proof of principle for x-ray backlighting.
Title: Study of x-ray emission from a table top plasma focus and its application as an x-ray backlighter
Description:
A study of a 2 kJ, 200 kA, table top plasma focus device as an intense x-ray source is reported.
The x-ray yield from a number of gases, (deuterium, nitrogen, neon, argon, and xenon) is measured as a function of filling pressure and in neon as a function of anode length.
In gases with Z<18, the plasma implodes to form a uniform cylindrical column, whereas for Z⩾18, the plasma consists of a number of hot spots.
A maximum x-ray yield of 16.
6 J and pulse length of 10–15 ns was obtained in neon.
The x-ray emission was established to be due to H- and He-like line radiation.
The temperature estimated from spectroscopic observations was about 300–400 eV at an electron density of (3–5)×1020 cm−3 in neon.
At low pressures in neon, hard x-ray radiation, presumably due to electron beams was dominant.
Mesh images of different wire materials were recorded at the optimum pressure in neon as a proof of principle for x-ray backlighting.
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