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Positive Ions in RF Discharge Plasma of CF 4 Gas in a Planar Diode
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Positive ions were measured in situ by direct sampling from CF4 discharge space at 13.56 MHz using a quadrupole mass spectrometer. CF3
+ is observed predominantly with smaller amounts of CF2
+ and CF+. With increasing RF power, both CF2
+ and CF+ shift to the lower energy side of CF3
+, and their intensities tend to increase. Such a phenomenon is also observed as controlling the potential of a sampling tip externally. These seem to suggest that CF2
+ and CF+ are produced mainly in the sheath region.
Title: Positive Ions in RF Discharge Plasma of CF 4 Gas in a Planar Diode
Description:
Positive ions were measured in situ by direct sampling from CF4 discharge space at 13.
56 MHz using a quadrupole mass spectrometer.
CF3
+ is observed predominantly with smaller amounts of CF2
+ and CF+.
With increasing RF power, both CF2
+ and CF+ shift to the lower energy side of CF3
+, and their intensities tend to increase.
Such a phenomenon is also observed as controlling the potential of a sampling tip externally.
These seem to suggest that CF2
+ and CF+ are produced mainly in the sheath region.
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