Extended Anode Effect in Coaxial Magnetron Pulsed Plasmas for Coating the Inside Surface of Narrow Tubes

In order to coat functional thin films onto the inside surface of narrow tubes, a coaxial magnetron pulsed plasma (CMPP) device has been developed. The feature of this device is that deposited conductive films play the role of an anode. Consequently, plasmas are generated away from the anode located at one end of the tube and the distribution of film thickness widens with increasing deposition time. This is called the extended anode effect. The shifting velocity of the main position for plasma generation was dependent on the properties of the target materials. The shifting velocity increased with sputtering yield and decreased with the electrical resistivity of target materials.