Search engine for discovering works of Art, research articles, and books related to Art and Culture
Javascript must be enabled to continue!
Main-Field Stitching Accuracy Analysis in Electron Beam Writing Systems
View through CrossRef
A new evaluation method for main-field positioning error for electron beam (E-Beam) writing systems has been developed. Main-field distortion caused by system-based main-field positioning error such as contamination charging, deflector calibration error, substrate height error and so on is the main factor impairing accuracy in E-Beam writing systems. Main-field distortion after elimination of deflection distortion is classified into four modes. The origin of main-field positioning error can be estimated by investigating the behavior of these four modes of main-field distortion. This method has been applied to the variable shaped beam (VSB), vector scanning, and continuously moving stage E-Beam system. Contamination charging problems in the final lens surface in opposition to substrate and problems in the deflector calibration method have been found. Main-field positioning error of the E-Beam system decreased from 0.1 µm to 0.04 µm after solving the above problems. The evaluation method for main-field positioning error has been proved to be very effective in accuracy improvement of E-Beam systems.
Title: Main-Field Stitching Accuracy Analysis in Electron Beam Writing Systems
Description:
A new evaluation method for main-field positioning error for electron beam (E-Beam) writing systems has been developed.
Main-field distortion caused by system-based main-field positioning error such as contamination charging, deflector calibration error, substrate height error and so on is the main factor impairing accuracy in E-Beam writing systems.
Main-field distortion after elimination of deflection distortion is classified into four modes.
The origin of main-field positioning error can be estimated by investigating the behavior of these four modes of main-field distortion.
This method has been applied to the variable shaped beam (VSB), vector scanning, and continuously moving stage E-Beam system.
Contamination charging problems in the final lens surface in opposition to substrate and problems in the deflector calibration method have been found.
Main-field positioning error of the E-Beam system decreased from 0.
1 µm to 0.
04 µm after solving the above problems.
The evaluation method for main-field positioning error has been proved to be very effective in accuracy improvement of E-Beam systems.
Related Results
Detection method of PCB component based on automatic optical stitching algorithm
Detection method of PCB component based on automatic optical stitching algorithm
Purpose
– This paper aims to propose image stitching by reduction of full line and taking line image as registration image to solve the problem of automatic optic i...
Unsupervised Deep Learning for Enhanced holoentropy Image Stitching
Unsupervised Deep Learning for Enhanced holoentropy Image Stitching
Traditional feature-based image stitching technologies rely heavily on feature detection quality, often failing to stitch images with few features or low resolution. The learning b...
Basic Characteristics of Beam Position Drift and Field Stitching Error Caused by Electron Beam Column Charging
Basic Characteristics of Beam Position Drift and Field Stitching Error Caused by Electron Beam Column Charging
The beam drift caused by column charging and its influence on field stitching error were experimentally studied in an electron optical column with a contaminated inner surface....
A real-time stitching method of aerial images based on tile map
A real-time stitching method of aerial images based on tile map
Aiming at the problems of small speed and large memory resource
consumption for aerial images got by Unmanned Aerial Vehicle (UAV),
which caused by the high pixel, high precision a...
Patterning Accuracy Estimation of Electron Beam Direct-Writing System EX-8D
Patterning Accuracy Estimation of Electron Beam Direct-Writing System EX-8D
Self-diagnosis functions related to patterning accuracy are important techniques for
developing, improving and maintaining electron beam exposure systems. An evaluation
m...
Particle-in-cell simulations of velocity scattering of an anisotropic electron beam by electrostatic and electromagnetic instabilities
Particle-in-cell simulations of velocity scattering of an anisotropic electron beam by electrostatic and electromagnetic instabilities
The velocity space scattering of an anisotropic electron beam (T⊥b/T∥b>1) flowing along a background magnetic field B0 through a cold plasma is investigated using both linea...
Western Mesoamerican Calendars and Writing Systems
Western Mesoamerican Calendars and Writing Systems
<i>Western Mesoamerican Calendars and Writing Systems</i> draws together studies by some of the world’s leading experts presented at a conference held in December 2020,...
Assessment of Chat-GPT, Gemini, and Perplexity in Principle of Research Publication: A Comparative Study
Assessment of Chat-GPT, Gemini, and Perplexity in Principle of Research Publication: A Comparative Study
Abstract
Introduction
Many researchers utilize artificial intelligence (AI) to aid their research endeavors. This study seeks to assess and contrast the performance of three sophis...