Javascript must be enabled to continue!
Reflecting Multilayer Coatings for EUV Projection Lithography
View through CrossRef
In the past 20 years, a very large effort has been devoted to the
development of multilayer reflecting coatings for the x-ray and
extreme ultraviolet (EUV) spectral regions. Out of this development
arose the concept of EUV projection lithography, and multilayer
coating represents the key technology which enable EUVPL. At the same
time it presents technical challenges to be overcome for EUVPL to
become a production tool. These lie in the physics and chemistry of
the multilayers, in the deposition technology and in the metrology of
the final coatings. In this paper these topics are reviewed, and some
interesting results obtained using the soft x-ray/EUV Calibration and
Standards beamline at the Advanced Light Source are presented.
Title: Reflecting Multilayer Coatings for EUV Projection Lithography
Description:
In the past 20 years, a very large effort has been devoted to the
development of multilayer reflecting coatings for the x-ray and
extreme ultraviolet (EUV) spectral regions.
Out of this development
arose the concept of EUV projection lithography, and multilayer
coating represents the key technology which enable EUVPL.
At the same
time it presents technical challenges to be overcome for EUVPL to
become a production tool.
These lie in the physics and chemistry of
the multilayers, in the deposition technology and in the metrology of
the final coatings.
In this paper these topics are reviewed, and some
interesting results obtained using the soft x-ray/EUV Calibration and
Standards beamline at the Advanced Light Source are presented.
Related Results
Discussion of Mask Alignment Accuracy for EUV Lithography
Discussion of Mask Alignment Accuracy for EUV Lithography
The shorter lithography printing light source wavelength is, the more accurate alignment is required for resist printing of high packing density integrated circuits (ICs). As to lo...
A non-invasive screening study of varnishes applied to three paintings by Edvard Munch using portable diffuse reflectance infrared Fourier transform spectroscopy (DRIFTS)
A non-invasive screening study of varnishes applied to three paintings by Edvard Munch using portable diffuse reflectance infrared Fourier transform spectroscopy (DRIFTS)
AbstractThe availability and popularity of portable non-invasive instrumentation for the study of paintings has increased due to a shift away from using micro-invasive techniques. ...
Like Me or Like Us
Like Me or Like Us
Research has shown abundant evidence for social projection, that is, the tendency to expect similarity between oneself and others ( Krueger, 1998a , 1998b ). This effect is stronge...
Intersemiotic projection and academic comics: towards a social semiotic framework of multimodal paratactic and hypotactic projection
Intersemiotic projection and academic comics: towards a social semiotic framework of multimodal paratactic and hypotactic projection
Abstract
Intersemiotic projection is one of the most common configurations in the knowledge construction process of academic comics. Although previous studies addres...
Comparative analysis of information tendency and application features for projection mapping technologies at cultural heritage sites
Comparative analysis of information tendency and application features for projection mapping technologies at cultural heritage sites
AbstractWith the rapid development of interactive technologies using projection mapping (PJM), these digital technologies have introduced new interpretative possibilities for the p...
Surface-Imaging Lithography
Surface-Imaging Lithography
Surface-imaging lithography is a technique which was first described by Taylor et al. nearly ten years ago. In this approach, a pattern is defined at the surface or near-surface re...
Kernel Projection Classifiers with Suppressing Features of Other Classes
Kernel Projection Classifiers with Suppressing Features of Other Classes
We propose a new classification method based on a kernel technique called suppressed kernel sample space projection classifier (SKSP), which is extended from kernel sample space pr...
Projection in Interaction and Projection in Grammar
Projection in Interaction and Projection in Grammar
AbstractIn this paper, I argue that there are fundamental common features shared by interaction and grammar that suggest some kind of interdependence between the two and a nonauton...