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Surface-Imaging Lithography
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Surface-imaging lithography is a technique which was first described by Taylor et al. nearly ten years ago. In this approach, a pattern is defined at the surface or near-surface regions of a resist rather than throughout the entire resist thickness. Surface-imaging can eliminate problems such as reflectivity variations due to different substrates or topography in optical lithography and backscattering in electron-beam lithography.2 The use of surface-imaging has also proven beneficial for deep-UV optical lithography, where the high absorbance of most resists necessitates such an approach.
Title: Surface-Imaging Lithography
Description:
Surface-imaging lithography is a technique which was first described by Taylor et al.
nearly ten years ago.
In this approach, a pattern is defined at the surface or near-surface regions of a resist rather than throughout the entire resist thickness.
Surface-imaging can eliminate problems such as reflectivity variations due to different substrates or topography in optical lithography and backscattering in electron-beam lithography.
2 The use of surface-imaging has also proven beneficial for deep-UV optical lithography, where the high absorbance of most resists necessitates such an approach.
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