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Control of X-Ray Beam Fluctuation in Synchrotron Radiation Lithography Beamline
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Using the focusing property of beamline optics, we have presented a new technique to directly measure the position and emission angle drifts of the synchrotron radiation (SR) source which may deteriorate the optical performance of a beamline consisting of focusing mirrors. A new methodology is also proposed to correct the SR source drifts, combining the above measuring technique, a SR beam position monitor (SRBPM) mounted on the beamline and the excitation of two steering magnets installed in a storage ring.
Title: Control of X-Ray Beam Fluctuation in Synchrotron Radiation Lithography Beamline
Description:
Using the focusing property of beamline optics, we have presented a new technique to directly measure the position and emission angle drifts of the synchrotron radiation (SR) source which may deteriorate the optical performance of a beamline consisting of focusing mirrors.
A new methodology is also proposed to correct the SR source drifts, combining the above measuring technique, a SR beam position monitor (SRBPM) mounted on the beamline and the excitation of two steering magnets installed in a storage ring.
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