The Sputtering Performance of Ag Sputtering Targets with Different Microstructure

Ag thin films are widely used as the key material for electronic industries, and magnetron sputtering has become a general approach for Ag thin films deposition by using Ag target as source materials. In our research, Ag targets in cold rolling state and annealing state were prepared. At first, the microstructure of Ag targets before and after sputtering was observed. Then, Ag thin films were prepared by direct current (DC) magnetron sputtering using the above two kinds of Ag targets. The microstructure of Ag thin films was characterized by scanning electron microscope (SEM), atomic force microscope (AFM) and confocal microscope, and the resistivity was measured by four-point probe. Finally, the relationship between Ag target and Ag thin films were discussed in details. The knowledge could give some new ideas on the preparing of metal sputtering targets and the optimization of the microstructure and properties of thin films thus sputtered.