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A Sensitivity-Enhanced Vertical-Resonant MEMS Electric Field Sensor Based on TGV Technology

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In order to enhance the sensitivity of wafer-level vacuum-packaged electric field sensors, this paper proposed a vertical-resonant MEMS electric field sensor based on TGV (Through Glass Via) technology. The microsensor is composed of the electric field sensing cover, the drive cover, and the SOI-based microstructures between them. TGV technology is innovatively used to fabricate the electric field sensing cover and the vertically-driven cover. The external electric field is concentrated and transmitted to the area below the silicon plate in the center of the electric field sensing cover through a metal plate and a metal pillar, reducing the coupling capacitance between the silicon plate and the packaging structure, thereby achieving the enhanced transmission of the electric field. The sensitivity-enhanced mechanism of the sensor is analyzed, and the key parameters of the sensor are optimized through finite element simulation. The fabrication process is designed and realized. A prototype is tested to characterize its performance. The experimental results indicate that the sensitivity of the sensor is 0.82 mV/(kV/m) within the electrostatic electric field ranging from 0–50 kV/m. The linearity of the sensor is 0.65%.
Title: A Sensitivity-Enhanced Vertical-Resonant MEMS Electric Field Sensor Based on TGV Technology
Description:
In order to enhance the sensitivity of wafer-level vacuum-packaged electric field sensors, this paper proposed a vertical-resonant MEMS electric field sensor based on TGV (Through Glass Via) technology.
The microsensor is composed of the electric field sensing cover, the drive cover, and the SOI-based microstructures between them.
TGV technology is innovatively used to fabricate the electric field sensing cover and the vertically-driven cover.
The external electric field is concentrated and transmitted to the area below the silicon plate in the center of the electric field sensing cover through a metal plate and a metal pillar, reducing the coupling capacitance between the silicon plate and the packaging structure, thereby achieving the enhanced transmission of the electric field.
The sensitivity-enhanced mechanism of the sensor is analyzed, and the key parameters of the sensor are optimized through finite element simulation.
The fabrication process is designed and realized.
A prototype is tested to characterize its performance.
The experimental results indicate that the sensitivity of the sensor is 0.
82 mV/(kV/m) within the electrostatic electric field ranging from 0–50 kV/m.
The linearity of the sensor is 0.
65%.

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