A perspective on electrode engineering in ultrathin ferroelectric heterostructures for enhanced tunneling electroresistance

The combination of ferroelectricity and quantum tunneling enables the tantalizing possibility of next-generation nonvolatile memories based on ferroelectric tunnel junctions (FTJs). In the last two decades, significant progress has been achieved in the understanding of FTJs in terms of the role of the critical thickness for ferroelectricity, interface-related factors that yield an enhanced tunneling electroresistance effect, as well exploiting the combination of magnetism and ferroelectricity to realize multiferroic or magnetoelectric tunnel junctions. One key ingredient in the successful design of FTJs is the type and nature of the electrode used—indeed device performance strongly hinges on the ability to precisely tune and modulate the electrostatic boundary conditions. This perspective presents an overview of the experimental state of the art in electrode engineering for FTJs. We discuss related governing factors and methods for various electrode-FTJ combinations, highlighting and comparing the advantages and weaknesses for each system. Finally, we also reveal the challenges and identify the opportunities for the future development of FTJs. In summary, we aim to provide significant insights into electrode engineering of high-quality FTJs with excellent tunneling electroresistance performance.