Effect of sputtering power on the properties of TiN coatings deposited by the magnetron sputtering

In this work, the TiN coatings on Ti6Al4V and Si substrates were deposited by magnetron sputtering. The effect of sputtering powers on structure and mechanical properties of the TiN coatings was investigated. X-ray diffraction patterns displayed a single phase of face centered cubic structure. Scanning electron microscope observations found that the particle morphology of the TiN coatings changed from a leaf or flat-shaped structure to a tetrahedron faceted one, similar to a pyramid. The particle size and deposition rate increased with increasing sputtering power due to higher energy bombardment of ion gas to surface target. Furthermore, the highest hardness value (22,8 GPa ± 1,2 GPa) corresponds to the TiN coating deposited at 250 W power. Finally, the friction coefficient increased from 0,46 to 0,61 with increasing sputtering power from 150 to 300 W.