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Optical Isolation of the Amplifier Cavity in XG-III PW Beamline
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Optical isolation with high-quality, large-aperture polarizers is commonly used in high-power laser facilities to suppress retro-reflected pulses. However, it is hard to manufacture these polarizers. We propose an approach of optical isolation with two plasma-electrode Pockels cells instead of large-aperture polarizers. In this approach, Nd:glass slabs placed at the Brewster′s angle are used as polarizers. The analysis results and the application performances in the Xingguang (Star Light) XG-III PW beamline indicate that this approach can supply good protection to optical components in laser facilities.
Title: Optical Isolation of the Amplifier Cavity in XG-III PW Beamline
Description:
Optical isolation with high-quality, large-aperture polarizers is commonly used in high-power laser facilities to suppress retro-reflected pulses.
However, it is hard to manufacture these polarizers.
We propose an approach of optical isolation with two plasma-electrode Pockels cells instead of large-aperture polarizers.
In this approach, Nd:glass slabs placed at the Brewster′s angle are used as polarizers.
The analysis results and the application performances in the Xingguang (Star Light) XG-III PW beamline indicate that this approach can supply good protection to optical components in laser facilities.
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